JPH0746437Y2 - 静電チャック - Google Patents
静電チャックInfo
- Publication number
- JPH0746437Y2 JPH0746437Y2 JP4469689U JP4469689U JPH0746437Y2 JP H0746437 Y2 JPH0746437 Y2 JP H0746437Y2 JP 4469689 U JP4469689 U JP 4469689U JP 4469689 U JP4469689 U JP 4469689U JP H0746437 Y2 JPH0746437 Y2 JP H0746437Y2
- Authority
- JP
- Japan
- Prior art keywords
- electrostatic chuck
- internal electrode
- fixing base
- wafer
- electrostatic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 11
- 239000004065 semiconductor Substances 0.000 claims description 3
- 239000004020 conductor Substances 0.000 claims description 2
- 239000002826 coolant Substances 0.000 claims 1
- 239000000919 ceramic Substances 0.000 description 13
- 238000001816 cooling Methods 0.000 description 4
- 239000000498 cooling water Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 208000037998 chronic venous disease Diseases 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Jigs For Machine Tools (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4469689U JPH0746437Y2 (ja) | 1989-04-17 | 1989-04-17 | 静電チャック |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4469689U JPH0746437Y2 (ja) | 1989-04-17 | 1989-04-17 | 静電チャック |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02135141U JPH02135141U (en]) | 1990-11-09 |
| JPH0746437Y2 true JPH0746437Y2 (ja) | 1995-10-25 |
Family
ID=31558227
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4469689U Expired - Lifetime JPH0746437Y2 (ja) | 1989-04-17 | 1989-04-17 | 静電チャック |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0746437Y2 (en]) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10304714B2 (en) | 2015-06-11 | 2019-05-28 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. | Device comprising film for electrostatic coupling of a substrate to a substrate carrier |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3662909B2 (ja) * | 1990-12-25 | 2005-06-22 | 日本碍子株式会社 | ウエハー吸着加熱装置及びウエハー吸着装置 |
| JP3699349B2 (ja) * | 1990-12-25 | 2005-09-28 | 日本碍子株式会社 | ウエハー吸着加熱装置 |
| JPH04300138A (ja) * | 1991-03-28 | 1992-10-23 | Shin Etsu Chem Co Ltd | 静電チャック |
| JP2804664B2 (ja) * | 1992-01-21 | 1998-09-30 | 株式会社日立製作所 | 試料の静電吸着機構及び電子線描画装置 |
| JP3596127B2 (ja) * | 1995-12-04 | 2004-12-02 | ソニー株式会社 | 静電チャック、薄板保持装置、半導体製造装置、搬送方法及び半導体の製造方法 |
| JP3847920B2 (ja) * | 1997-10-06 | 2006-11-22 | 株式会社アルバック | 静電吸着ホットプレート、真空処理装置、及び真空処理方法 |
| JP4357630B2 (ja) * | 1999-04-02 | 2009-11-04 | 本田技研工業株式会社 | 冷却機構を備えた切削加工装置 |
| JP2001144167A (ja) * | 1999-11-12 | 2001-05-25 | Ngk Insulators Ltd | 半導体保持装置 |
| JP4698097B2 (ja) * | 2001-09-26 | 2011-06-08 | 京セラ株式会社 | ウェハ支持部材 |
| JP4783213B2 (ja) * | 2005-06-09 | 2011-09-28 | 日本碍子株式会社 | 静電チャック |
| CN102473668B (zh) * | 2009-07-02 | 2015-01-14 | 创意科技股份有限公司 | 静电吸附构造体及其制造方法 |
| US20170170047A1 (en) * | 2014-01-22 | 2017-06-15 | Ulvac, Inc. | Plasma treatment device and wafer transfer tray |
| JP2016136552A (ja) * | 2015-01-23 | 2016-07-28 | 株式会社日立ハイテクノロジーズ | プラズマ処理装置 |
| JP6924618B2 (ja) * | 2017-05-30 | 2021-08-25 | 東京エレクトロン株式会社 | 静電チャック及びプラズマ処理装置 |
| JP6811144B2 (ja) * | 2017-05-30 | 2021-01-13 | 東京エレクトロン株式会社 | プラズマ処理装置の静電チャックを運用する方法 |
| JP7478903B1 (ja) | 2022-06-28 | 2024-05-07 | 日本碍子株式会社 | ウエハ載置台 |
-
1989
- 1989-04-17 JP JP4469689U patent/JPH0746437Y2/ja not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10304714B2 (en) | 2015-06-11 | 2019-05-28 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. | Device comprising film for electrostatic coupling of a substrate to a substrate carrier |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02135141U (en]) | 1990-11-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |